Precise process monitoring system for anisotropic etching
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F05%3APU54673" target="_blank" >RIV/00216305:26220/05:PU54673 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Precise process monitoring system for anisotropic etching
Original language description
This paper covers precise monitoring system for monolithic tungsten wire manufacture. This device is designed in order to analyze and control optimal cathode etching process. Main function of this control unit is to control position system, measure etching current and temperature and control cathode etching process.
Czech name
Precizní monitorovací systém pro anisotropní leptání
Czech description
This paper covers precise monitoring system for monolithic tungsten wire manufacture. This device is designed in order to analyze and control optimal cathode etching process. Main function of this control unit is to control position system, measure etching current and temperature and control cathode etching process.
Classification
Type
D - Article in proceedings
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2005
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Socrates Workshop Intensive Training Programme in Electronic Systeme Design Proceedings.
ISBN
80-214-3042-7
ISSN
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e-ISSN
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Number of pages
3
Pages from-to
152-154
Publisher name
Technological Institute of Chania
Place of publication
Greece
Event location
Chania, Crete, Greece
Event date
Sep 21, 2005
Type of event by nationality
CST - Celostátní akce
UT code for WoS article
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