Snap-back characteristics tuning of SCR-based semiconductor structures
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F08%3APU73709" target="_blank" >RIV/00216305:26220/08:PU73709 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Snap-back characteristics tuning of SCR-based semiconductor structures
Original language description
Semiconductor structures having snap-back type of I-V characteristics are very useful in ESD (electrostatic discharge) protection design. ESD protection structures act as a protection of integrated circuits against the parasitic electrostatic discharge.The typical protection structure having the snap-back type of I-V characteristic is a SCR (silicon controlled rectifier) or a gate grounded NMOS transistor. This text is dealing with structures which enable tuning of I-V snapback characteristics. The simulated technology was CMOS very high voltage (VHVIC). The measurement was done for samples manufactured in 1.5um BiCMOS.
Czech name
Ladění A/V charakteristik S-typu u polovodičových struktur na bázi tyristoru
Czech description
Článek popisuje polovodičové struktury na bázi tyristoru, které lze použit v návrhu ESD ochran pro integrované obvody. Popisuje jakým způsobem lze tyto struktury ladit pomozí rozměrů layoutu tak, aby se patřičně měnili napěťové úrovně A/V charakteristikS-typu.
Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Result continuities
Project
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Continuities
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2008
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
WSEAS Transactions on Electronics
ISSN
1109-9445
e-ISSN
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Volume of the periodical
4
Issue of the periodical within the volume
9
Country of publishing house
US - UNITED STATES
Number of pages
6
Pages from-to
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UT code for WoS article
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EID of the result in the Scopus database
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