Charge Carrier Transport in Ta2O5 Oxide Nanolayers

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F10%3APU90286" target="_blank" >RIV/00216305:26220/10:PU90286 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Charge Carrier Transport in Ta2O5 Oxide Nanolayers

Original language description

The paper will present the modeling of charge transport in Ta2O5 nanolayers together with experimental verification of the model. MIS structure model for tantalum capacitors with conducting polymer cathode will be described on the base of the leakage current analysis. Ta205 films show good electrical and dielectric properties for considered applications and low leakage current density value 10-4A/m2 for the electric field 100 MV/m. Dominant mechanism of charge carrier transport is ohmic conduction for the low electric field, while Poole-Frenkel mechanism becomes dominant for electric fields in the range 100 to 200 MV/m. Tunneling current becomes dominant for the electric field higher than 200 MV/m. Ohmic current component and Poole-Frenkel current component are thermally activated, while the tunnelling current component is temperature independent. We have observed that for temperatures above 250 K the leakage current is given predominantly by the ohmic and Poole-Frenkel mechanism. For

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

JA - Electronics and optoelectronics

OECD FORD branch

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Project

<a href="/en/project/GA102%2F09%2F1920" target="_blank" >GA102/09/1920: Stochastic Phenomena in MIS and MIM Semiconductor Structures</a><br>

Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2010

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

ElectroScope - http://www.electroscope.zcu.cz

ISSN

1802-4564

e-ISSN

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Volume of the periodical

2010

Issue of the periodical within the volume

3

Country of publishing house

CZ - CZECH REPUBLIC

Number of pages

4

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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