TEMPERATURE AND FREQUENCY DEPENDENCE OF COMPLEX PERMITTIVITY FOR NIOBIUM OXIDE FILM AT COMMERCIAL ELECTROLYTIC CAPACITOR

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F12%3APU104334" target="_blank" >RIV/00216305:26220/12:PU104334 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

TEMPERATURE AND FREQUENCY DEPENDENCE OF COMPLEX PERMITTIVITY FOR NIOBIUM OXIDE FILM AT COMMERCIAL ELECTROLYTIC CAPACITOR

Original language description

The complex permittivity of thin oxide film at commercial niobium oxide capacitor was measured at different temperature range 218-373 K by using Janis cryostat system, with HP 4284A impedance analyzer with frequencies from 20 Hz to 1MHz. The real part ofcomplex permittivity increases with temperature and decreases with frequency, the imaginary part of complex permittivity displays abroad maximum peak whose position shifts with temperature to a higher frequency region with an activation energy 0.055 eV.The measured imaginary parts of complex permittivity were studied by the graphical analysis of the obtained data as proposed by Havriliak -Negami (HN) equation.

Czech name

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Czech description

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Type

D - Article in proceedings

CEP classification

JA - Electronics and optoelectronics

OECD FORD branch

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Project

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Continuities

S - Specificky vyzkum na vysokych skolach

Publication year

2012

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

Proceedings of the conference VSACKÝ CÁB 2012

ISBN

978-80-214-4579-6

ISSN

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e-ISSN

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Number of pages

4

Pages from-to

4-7

Publisher name

FEKT VUT Brno

Place of publication

VSACKÝ CÁB

Event location

Vsetín

Event date

Aug 29, 2012

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

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