Micromorphology of AlN Epilayers on Sapphire Substrates
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F17%3APU125080" target="_blank" >RIV/00216305:26220/17:PU125080 - isvavai.cz</a>
Result on the web
<a href="http://dpi-proceedings.com/index.php/dtcse/issue/view/157" target="_blank" >http://dpi-proceedings.com/index.php/dtcse/issue/view/157</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.12783/dtcse/cece2017/14582" target="_blank" >10.12783/dtcse/cece2017/14582</a>
Alternative languages
Result language
angličtina
Original language name
Micromorphology of AlN Epilayers on Sapphire Substrates
Original language description
The purpose of this paper was to describe the 3D nano-scaled surface topography of the aluminum nitride on sapphire. The structures were prepared by magnetron sputtering with heating of the sapphire substrate. The dependence of the layers topography on the substrate temperature was presented. Surface appearance was studied by atomic force microscopy (AFM). The quantitative topography data from AFM were used for surface characterization by fractal analysis and statistical parameters. The results of fractal analysis show the correlation of fractal dimension and statistical characteristics of surface topography. The data may contribute to manufacture of AlN thin films with desired surface characteristics.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
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OECD FORD branch
20201 - Electrical and electronic engineering
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
DEStech Transactions on Computer Science and Engineering
ISBN
978-1-60595-476-9
ISSN
2475-8841
e-ISSN
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Number of pages
6
Pages from-to
465-470
Publisher name
DEStech Publications, Inc.
Place of publication
439 North Duke Street Lancaster, Pennsylvania 1
Event location
Sanya
Event date
Jun 25, 2017
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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