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Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F21%3APU141413" target="_blank" >RIV/00216305:26220/21:PU141413 - isvavai.cz</a>

  • Result on the web

    <a href="https://www.sciencedirect.com/science/article/pii/S0042207X21004826?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/pii/S0042207X21004826?via%3Dihub</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1016/j.vacuum.2021.110533" target="_blank" >10.1016/j.vacuum.2021.110533</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Investigation of hydrogen impurities in PE-ALD AlN thin films by IBA methods

  • Original language description

    Hydrogen impregnation is one of the main sources of contamination in AlN thin films obtained by atomic layer deposition method (ALD) as many studies report. Such impurities can be potentially detrimental to mechanical and electrical properties of the material. In this study methods belonging to ion-beam analysis (IBA) group, namely: elastic recoil detection analysis (ERDA), nuclear reaction analysis (NRA) and secondary-ion mass spectrometry (SIMS) were utilized to examine AlN thin films obtained by plasma-enhanced atomic layer deposition (PE-ALD) with use of trimethylaluminium (TMA) and N2+H2 gas mixture as precursors. Several depositions of AlN layers were carried out with different values of N2+H2 flux intensity (20, 100, 150 sccm) and TMA pulse (0.06, 0.12, 0.15 s) in order to investigate whether such alterations would produce any effect on the resulting films. Data obtained within the scope of this study suggest that AlN grown by PE-ALD exhibit rather low amounts of hydrogen impurities, especially when compared to thermal ALD. Furthermore, the effect of high-temperature treatment in N2 atmosphere was studied and was found out to produce a positive effect on the chemical composition of AlN films.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2021

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Vacuum

  • ISSN

    0042-207X

  • e-ISSN

  • Volume of the periodical

    193

  • Issue of the periodical within the volume

    1

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    9

  • Pages from-to

    1-9

  • UT code for WoS article

    000702762500004

  • EID of the result in the Scopus database

    2-s2.0-85112834158