Measurement and Optimization of an ECR Plasma Source

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F21%3APU145321" target="_blank" >RIV/00216305:26220/21:PU145321 - isvavai.cz</a>

Result on the web

<a href="https://ieeexplore.ieee.org/document/9694823" target="_blank" >https://ieeexplore.ieee.org/document/9694823</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1109/PIERS53385.2021.9694823" target="_blank" >10.1109/PIERS53385.2021.9694823</a>

Result language

angličtina

Original language name

Measurement and Optimization of an ECR Plasma Source

Original language description

Electron cyclotron resonance (ECR) is a very common technique for various kinds of applications. Among others, it is widely used in the field of semiconductor or material industry, electron microscopy or plasmatic machining. This paper deals with an ECR source of plasma, which is used for ions generation. The plasma source uses the cyclotron resonance principle for Xenon gas ionization and efficient plasma generation. This technology is advantageous for selected application for several reasons, especially for a wide range of optimization options of the drive system. The used measurement methods are based on well-known information about the ion source and standard working conditions. Within this paper, we optimize the conditions to find out the best set of input parameters. The output of this experiment is a multidimensional map of the working conditions, essential to evaluate the dependences of variable working pressure, excitation energies and frequencies and to understand the consequences, arising from this complex measurement. The test environment is based on an electron microscope system, which is used for measuring and controlling all working conditions. Above that, an external high-frequency power source was used for plasma excitation. Such setup enables to set and tune all the parameters, collect measured information, and interpret them easily.

Czech name

—

Czech description

—

Type

D - Article in proceedings

CEP classification

—

OECD FORD branch

20200 - Electrical engineering, Electronic engineering, Information engineering

Project

—

Continuities

S - Specificky vyzkum na vysokych skolach

Publication year

2021

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Article name in the collection

2021 Photonics & Electromagnetics Research Symposium (PIERS)

ISBN

978-1-7281-7247-7

ISSN

1559-9450

e-ISSN

—

Number of pages

4

Pages from-to

358-361

Publisher name

IEEE

Place of publication

NEW YORK

Event location

Hangzhou, China

Event date

Nov 21, 2021

Type of event by nationality

WRD - Celosvětová akce

UT code for WoS article

000795902300052