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Numerical Analysis of ECR Plasma Source

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26220%2F21%3APU146189" target="_blank" >RIV/00216305:26220/21:PU146189 - isvavai.cz</a>

  • Result on the web

    <a href="https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=9694836" target="_blank" >https://ieeexplore.ieee.org/stamp/stamp.jsp?tp=&arnumber=9694836</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1109/PIERS53385.2021.9694836" target="_blank" >10.1109/PIERS53385.2021.9694836</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Numerical Analysis of ECR Plasma Source

  • Original language description

    Gases ionizers usage ECR (Electron Cyclotron Resonance) is one of the methods for creating two temperature plasma. Thanks to high efficiency is this method suitable for wide spectrum of applications. Especially for the systems which are sensitives on high power electrical noise, cooling is problematic for them or they have limited power supplier (electron microscopy, plasma actuators, etc.). The main disadvantage of ECR plasma sources is complicated design compared to the other ionisation techniques. The crucial is tune of the magnetostatics and high frequency fields in active area of the source. Working frequency also plays an important role and even electric and magnetic field ratio. This paper describes how to calculate electric and magnetic fields inside ECR plasma sources and how to enable tune and optimization of these sources. Paper also shows how to make visualisation of the active ECR surfaces and thereby deepening the understanding of how the sources works.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

  • OECD FORD branch

    20200 - Electrical engineering, Electronic engineering, Information engineering

Result continuities

  • Project

  • Continuities

    S - Specificky vyzkum na vysokych skolach

Others

  • Publication year

    2021

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    2021 Photonics & Electromagnetics Research Symposium (PIERS)

  • ISBN

    978-1-7281-7247-7

  • ISSN

    1559-9450

  • e-ISSN

  • Number of pages

    4

  • Pages from-to

    419-422

  • Publisher name

    IEEE

  • Place of publication

    NEW YORK

  • Event location

    Hangzhou, China

  • Event date

    Nov 21, 2021

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article

    000795902300064