Optical properties of isotropic and anisotropic films deposited by pulsed plasma
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F14%3APU113719" target="_blank" >RIV/00216305:26310/14:PU113719 - isvavai.cz</a>
Result on the web
—
DOI - Digital Object Identifier
—
Alternative languages
Result language
angličtina
Original language name
Optical properties of isotropic and anisotropic films deposited by pulsed plasma
Original language description
Isotropic plasma-polymerized films were made from tetravinylsilane (TVS) monomer and its mixture with argon or oxygen gas. Films were deposited on polished silicon wafer (100) using plasma-enhanced chemical vapor deposition at pulsed RF plasma (13.56 MHz). The substrates were pretreated by argon plasma (10sccm, 5.7Pa, 5 W) for 10min to improve the film adhesion. The films were prepared at a total mass flow rate of 3.8 sccm (2.7 Pa), the content of argon or oxygen gas in a mixture ranging 0-92%, and theeffective power operated from 2 to 250 W. The thickness of isotropic films was varied from 10 nm to 1 ?m. An in-situ phase-modulated spectroscopic ellipsometer UVISEL (Jobin-Yvon) was employed to characterize the film thickness and optical properties ofdeposited films in the spectral range 250-830 nm. The dispersion dependence of the dielectric function was fitted using the five-parametric Tauc-Lorentz formula. We found out that optical parameters of deposited films are controlled by ef
Czech name
—
Czech description
—
Classification
Type
O - Miscellaneous
CEP classification
CF - Physical chemistry and theoretical chemistry
OECD FORD branch
—
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů