Nonthermal tetravinylsilane plasma used for thin-film deposition: Plasma chemistry controls thin-film chemistry
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F21%3APU143001" target="_blank" >RIV/00216305:26310/21:PU143001 - isvavai.cz</a>
Result on the web
<a href="https://onlinelibrary.wiley.com/doi/10.1002/ppap.202100192" target="_blank" >https://onlinelibrary.wiley.com/doi/10.1002/ppap.202100192</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/ppap.202100192" target="_blank" >10.1002/ppap.202100192</a>
Alternative languages
Result language
angličtina
Original language name
Nonthermal tetravinylsilane plasma used for thin-film deposition: Plasma chemistry controls thin-film chemistry
Original language description
The power dependence of the plasma species in nonthermal tetravinylsilane plasmas used for thin-film deposition is investigated by mass spectrometry. Mass spectra analysis reveals the dominant carbon and silicon-containing species responsible for film growth. The deposition rate determined by in situ spectroscopic ellipsometry correlates with the flux of these species chemisorbed on the film surface if distinct sticking coefficients are taken into account. Then, the carbon to silicon ratio in the deposited film strongly correlates with the C/Si flux ratio for the various power-controlled plasmas. Similarly, the concentration of vinyl groups incorporated into the deposited film and the proportion of sp2 hybridization of the carbon network correlate with the fluxes of the respective plasma species.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10403 - Physical chemistry
Result continuities
Project
<a href="/en/project/GA16-09161S" target="_blank" >GA16-09161S: Synthesis of multifunctional plasma polymers for polymer composites without interfaces</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Processes and Polymers
ISSN
1612-8850
e-ISSN
1612-8869
Volume of the periodical
neuveden
Issue of the periodical within the volume
e2100192
Country of publishing house
DE - GERMANY
Number of pages
13
Pages from-to
1-13
UT code for WoS article
000734997800001
EID of the result in the Scopus database
2-s2.0-85122012747