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Nonthermal tetravinylsilane plasma used for thin-film deposition: Plasma chemistry controls thin-film chemistry

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26310%2F21%3APU143001" target="_blank" >RIV/00216305:26310/21:PU143001 - isvavai.cz</a>

  • Result on the web

    <a href="https://onlinelibrary.wiley.com/doi/10.1002/ppap.202100192" target="_blank" >https://onlinelibrary.wiley.com/doi/10.1002/ppap.202100192</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1002/ppap.202100192" target="_blank" >10.1002/ppap.202100192</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Nonthermal tetravinylsilane plasma used for thin-film deposition: Plasma chemistry controls thin-film chemistry

  • Original language description

    The power dependence of the plasma species in nonthermal tetravinylsilane plasmas used for thin-film deposition is investigated by mass spectrometry. Mass spectra analysis reveals the dominant carbon and silicon-containing species responsible for film growth. The deposition rate determined by in situ spectroscopic ellipsometry correlates with the flux of these species chemisorbed on the film surface if distinct sticking coefficients are taken into account. Then, the carbon to silicon ratio in the deposited film strongly correlates with the C/Si flux ratio for the various power-controlled plasmas. Similarly, the concentration of vinyl groups incorporated into the deposited film and the proportion of sp2 hybridization of the carbon network correlate with the fluxes of the respective plasma species.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10403 - Physical chemistry

Result continuities

  • Project

    <a href="/en/project/GA16-09161S" target="_blank" >GA16-09161S: Synthesis of multifunctional plasma polymers for polymer composites without interfaces</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2021

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Plasma Processes and Polymers

  • ISSN

    1612-8850

  • e-ISSN

    1612-8869

  • Volume of the periodical

    neuveden

  • Issue of the periodical within the volume

    e2100192

  • Country of publishing house

    DE - GERMANY

  • Number of pages

    13

  • Pages from-to

    1-13

  • UT code for WoS article

    000734997800001

  • EID of the result in the Scopus database

    2-s2.0-85122012747