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Toward Site-Specific Dopant Contrast in Scanning Electron Microscopy

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F14%3APU109853" target="_blank" >RIV/00216305:26620/14:PU109853 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.1017/S1431927614000968" target="_blank" >http://dx.doi.org/10.1017/S1431927614000968</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1017/S1431927614000968" target="_blank" >10.1017/S1431927614000968</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Toward Site-Specific Dopant Contrast in Scanning Electron Microscopy

  • Original language description

    Since semiconductor devices are being scaled down to dimensions of several nanometers there is a growing need for techniques capable of quantitative analysis of dopant concentrations at the nanometer scale in all three dimensions. Imaging dopant contrast by scanning electron microscopy (SEM) is a very promising method, but many unresolved issues hinder its routine application for device analysis, especially in cases of buried layers where site-specific sample preparation is challenging. Here, we report on optimization of site-specific sample preparation by the focused Ga ion beam (FIB) technique that provides improved dopant contrast in SEM. Similar to FIB lamella preparation for transmission electron microscopy, a polishing sequence with decreasing ion energy is necessary to minimize the thickness of the electronically dead layer. We have achieved contrast values comparable to the cleaved sample, being able to detect dopant concentrations down to 1x10^16 cm^-3. A theoretical model shows that the electronically dead layer corresponds to an amorphized Si layer formed during ion beam polishing. Our results also demonstrate that contamination issues are significantly suppressed for FIB-treated samples compared with cleaved ones.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10302 - Condensed matter physics (including formerly solid state physics, supercond.)

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2014

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    MICROSCOPY AND MICROANALYSIS

  • ISSN

    1431-9276

  • e-ISSN

    1435-8115

  • Volume of the periodical

    20

  • Issue of the periodical within the volume

    4

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    6

  • Pages from-to

    1312-1317

  • UT code for WoS article

    000340259800038

  • EID of the result in the Scopus database