Toward Site-Specific Dopant Contrast in Scanning Electron Microscopy
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F14%3APU109853" target="_blank" >RIV/00216305:26620/14:PU109853 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1017/S1431927614000968" target="_blank" >http://dx.doi.org/10.1017/S1431927614000968</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1017/S1431927614000968" target="_blank" >10.1017/S1431927614000968</a>
Alternative languages
Result language
angličtina
Original language name
Toward Site-Specific Dopant Contrast in Scanning Electron Microscopy
Original language description
Since semiconductor devices are being scaled down to dimensions of several nanometers there is a growing need for techniques capable of quantitative analysis of dopant concentrations at the nanometer scale in all three dimensions. Imaging dopant contrast by scanning electron microscopy (SEM) is a very promising method, but many unresolved issues hinder its routine application for device analysis, especially in cases of buried layers where site-specific sample preparation is challenging. Here, we report on optimization of site-specific sample preparation by the focused Ga ion beam (FIB) technique that provides improved dopant contrast in SEM. Similar to FIB lamella preparation for transmission electron microscopy, a polishing sequence with decreasing ion energy is necessary to minimize the thickness of the electronically dead layer. We have achieved contrast values comparable to the cleaved sample, being able to detect dopant concentrations down to 1x10^16 cm^-3. A theoretical model shows that the electronically dead layer corresponds to an amorphized Si layer formed during ion beam polishing. Our results also demonstrate that contamination issues are significantly suppressed for FIB-treated samples compared with cleaved ones.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
MICROSCOPY AND MICROANALYSIS
ISSN
1431-9276
e-ISSN
1435-8115
Volume of the periodical
20
Issue of the periodical within the volume
4
Country of publishing house
US - UNITED STATES
Number of pages
6
Pages from-to
1312-1317
UT code for WoS article
000340259800038
EID of the result in the Scopus database
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