Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F16%3APU121164" target="_blank" >RIV/00216305:26620/16:PU121164 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1116/1.4966959" target="_blank" >http://dx.doi.org/10.1116/1.4966959</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/1.4966959" target="_blank" >10.1116/1.4966959</a>
Alternative languages
Result language
angličtina
Original language name
Patterning large area plasmonic nanostructures on nonconductive substrates using variable pressure electron beam lithography
Original language description
Variable pressure electron beam lithography (VP-EBL) is a unique technique offering alternative cost-effective approach for patterning on nonconductive substrates that are often required for many applications in the field of plasmonics. Here, the authors present the use of the VP-EBL for accurate fabrication of nanoantennas with plasmonic resonances in visible range in order to achieve artificial sample coloring. Using confocal transmission spectroscopy, the authors show that optimized VP-EBL process enables fabrication of plasmonic nanoantennas with optical properties equivalent to those produced via traditional approach. Furthermore, the authors demonstrate high stability of the exposure process by fabricating a millimeter-sized color image composed of plasmonic nanoantennas.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10302 - Condensed matter physics (including formerly solid state physics, supercond.)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B
ISSN
1071-1023
e-ISSN
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Volume of the periodical
34
Issue of the periodical within the volume
6
Country of publishing house
US - UNITED STATES
Number of pages
4
Pages from-to
„ 06K801-1“-„ 06K801-4“
UT code for WoS article
000389530000024
EID of the result in the Scopus database
2-s2.0-84994728096