Patterning large area plasmonic nanostructures on non-conductive substrates using variable pressure electron beam lithography

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F01733214%3A_____%2F16%3AN0000002" target="_blank" >RIV/01733214:_____/16:N0000002 - isvavai.cz</a>
Result on the web
<a href="http://eipbn.omnibooksonline.com/data/papers/2016/4A5.pdf#page=1" target="_blank" >http://eipbn.omnibooksonline.com/data/papers/2016/4A5.pdf#page=1</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/1.4966959" target="_blank" >10.1116/1.4966959</a>

Result language
angličtina
Original language name
Patterning large area plasmonic nanostructures on non-conductive substrates using variable pressure electron beam lithography
Original language description
Our research is focused on variable pressure electron beam lithography (VP-EBL). VP-EBL is based on the introduction of residual N2 gas atmosphere in the specimen chamber in order to create positive ions to balance negatively charged sample surface. The main advantage of our approach is no need of any sample pre-exposure or post-exposure treatment.
Czech name
—
Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
JA - Electronics and optoelectronics
OECD FORD branch
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Project
<a href="/en/project/TE01020233" target="_blank" >TE01020233: Advanced Microscopy and Spectroscopy Platform for Research and Development in Nano and Microtechnologies - AMISPEC</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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