Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F18%3APU128518" target="_blank" >RIV/00216305:26620/18:PU128518 - isvavai.cz</a>
Result on the web
<a href="https://link.springer.com/article/10.1007/s10404-018-2125-6" target="_blank" >https://link.springer.com/article/10.1007/s10404-018-2125-6</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1007/s10404-018-2125-6" target="_blank" >10.1007/s10404-018-2125-6</a>
Alternative languages
Result language
angličtina
Original language name
Fabrication of buried microfluidic channels with observation windows using femtosecond laser photoablation and parylene-C coating
Original language description
We developed an advanced method for fabricating microfluidic structures comprising channels and inputs/outputs buried within a silicon wafer based on single level lithography. We etched trenches into a silicon substrate, covered these trenches with parylene-C, and selectively opened their bottoms using femtosecond laser photoablation, forming channels and inputs/outputs by isotropic etching of silicon by xenon difluoride vapors. We subsequently sealed the channels with a second parylene-C layer. Unlike in previously published works, this entire process is conducted at ambient temperature to allow for integration with complementary metal oxide semiconductor devices for smart readout electronics. We also demonstrated a method of chip cryo-cleaving with parylene presence that allows for monitoring of the process development. We also created an observation window for in situ visualization inside the opaque silicon substrate by forming a hole in the parylene layer at the silicon backside and with local silicon removal by xenon difluoride vapor etching. We verified the microfluidic chip performance by forming a segmented flow of a fluorescein solution in an oil stream. This proposed technique provides opportunities for forming simple microfluidic systems with buried channels at ambient temperature.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Microfluidics and Nanofluidics
ISSN
1613-4982
e-ISSN
1613-4990
Volume of the periodical
22
Issue of the periodical within the volume
9
Country of publishing house
DE - GERMANY
Number of pages
7
Pages from-to
1-7
UT code for WoS article
000443569300001
EID of the result in the Scopus database
2-s2.0-85052760399