Optical and fractal properties of sputter deposited TiO2 films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F23%3APU148506" target="_blank" >RIV/00216305:26620/23:PU148506 - isvavai.cz</a>
Result on the web
<a href="https://link.springer.com/article/10.1007/s11082-022-04295-2" target="_blank" >https://link.springer.com/article/10.1007/s11082-022-04295-2</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1007/s11082-022-04295-2" target="_blank" >10.1007/s11082-022-04295-2</a>
Alternative languages
Result language
angličtina
Original language name
Optical and fractal properties of sputter deposited TiO2 films
Original language description
In this study, TiO2 films were deposited on the glass substrates at different pressures using a DC magnetron sputtering system. The surface topography, fractality, particle size, transparency spectra, and roughness of the deposited films were analyzed through atomic force microscopy in non-contact mode and spectrophotometer (UV-visible) analysis. The Gwyddion open source software was used to analyze the AFM results. The surface morphology, absorption spectra, transparency, and energy band gap of the films were studied through analytical and mathematical relations, including fractal and multifractal dimensions of the films. The pressure influenced the particle size leading to the changes in the surface roughness and fractality of the films. When the working pressure increased above 8 x 10(-3) Torr, the nonuniformity in the distribution of surface properties and multifractality increased. Additionally, using optical data and the Tauc's method, their energy gap was calculated. It was revealed that the TiO2 coatings have a relatively large energy gap of similar to 4 eV, probably due to their small grain size.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20200 - Electrical engineering, Electronic engineering, Information engineering
Result continuities
Project
<a href="/en/project/FV40238" target="_blank" >FV40238: Advanced microsocpy techniques</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Optical and Quantum Electronics
ISSN
0306-8919
e-ISSN
1572-817X
Volume of the periodical
55
Issue of the periodical within the volume
2
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
15
Pages from-to
„“-„“
UT code for WoS article
000900117000030
EID of the result in the Scopus database
2-s2.0-85144171375