Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F00216305%3A26620%2F26%3A0199235" target="_blank" >RIV/00216305:26620/26:0199235 - isvavai.cz</a>
Result on the web
<a href="https://pubs.aip.org/avs/jvb/article/43/3/034202/3344493/Compact-vacuum-setup-for-laser-induced-plasma" target="_blank" >https://pubs.aip.org/avs/jvb/article/43/3/034202/3344493/Compact-vacuum-setup-for-laser-induced-plasma</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/6.0004296" target="_blank" >10.1116/6.0004296</a>
Alternative languages
Result language
angličtina
Original language name
Compact vacuum setup for laser induced plasma etching with optical emission spectrum monitoring
Original language description
Reactive ion etching and reactive ion beam etching are widely used processes in the semiconductor industry but face challenges due to their high cost, energy demands, and maintenance complexity. Femtosecond laser micromachining has emerged as a versatile and precise method for microfabrication, but it often results in suboptimal surface quality, which requires postprocessing. Laser-induced plasma etching (LIPE) presents a promising solution, achieving low surface roughness and efficient material removal rates. Here, we investigate the LIPE process by utilizing a femtosecond laser setup with optimized optical components and a custom-designed compact vacuum chamber, enabling precise control and monitoring of the reactive gas environment for plasma generation and etching. The effects of numerical aperture, working distance, and laser energy thresholds on plasma ignition and plume formation were examined. Preliminary results demonstrate plasma ignition in air and SF6 gas with laser pulse energy thresholds between 15 and 20 mu J using a 10x magnification microscope objective. The spectral analysis of the plasma generated in the SF6 gas provides insights into plasma dynamics and enables real-time process monitoring. This work establishes foundational parameters for optimizing LIPE setups and advancing precision etching applications.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20201 - Electrical and electronic engineering
Result continuities
Project
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Continuities
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Others
Publication year
2025
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Vacuum Science & Technology B
ISSN
2166-2746
e-ISSN
2166-2754
Volume of the periodical
3
Issue of the periodical within the volume
43
Country of publishing house
US - UNITED STATES
Number of pages
7
Pages from-to
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UT code for WoS article
001470421800001
EID of the result in the Scopus database
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