RBS and XPS Measurements of Ag and Er Implantation into the Silica Glass
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F44555601%3A13440%2F09%3A00004905" target="_blank" >RIV/44555601:13440/09:00004905 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
RBS and XPS Measurements of Ag and Er Implantation into the Silica Glass
Original language description
Metal particle implantation into glasses has promising properties for application in optical devices. These properties depend on the size, shape, density and spatial distribution of metal particles [1]. Heavy-ion implantation of silica glasses is an efficient method of fabrication of the metal-nanoparticles composites that are promising for ultra-fast optical devices [2]. Implantation of Ag and Er ions into silicate glass was studied in this work. The energies of the implanted Ag and Er ions were 330 keV and used implantation fluence of ions was 1.0 x 1016 ions.cm-2. The depth distribution and diffusion profiles of implanted Ag and Er were investigated using X-ray photoelectron spectroscopy (XPS) and the Rutherford Backscattering Spectrometry (RBS) with the 2.0 MeV He+ ions, the incoming angle was 0° while the scattering angle was 170°. XPS depth profiles of the different elements were carried out by cycles of Ar+ sputtering at energy of 2.5 keV. Owing to surface charging, samples show
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
<a href="/en/project/LC06041" target="_blank" >LC06041: Preparation, modification and characterization of materials by energetic radiation.</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2009
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
Book of Contributed Papers of 17th Symposium on Application of Plasma Processe - Visegrad Workshop on Research of Plasma Physics,
ISBN
978-80-89186-46-4
ISSN
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e-ISSN
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Number of pages
2
Pages from-to
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Publisher name
Comenius University in Bratislava; Humboldt-Club Slovakia, Bratislava
Place of publication
Bratislava, Slovakia
Event location
Liptovský Ján, Slovakia
Event date
Jan 17, 2009
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
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