High deposition rate films prepared by reactive HiPIMS
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F45309787%3A_____%2F21%3AN0000001" target="_blank" >RIV/45309787:_____/21:N0000001 - isvavai.cz</a>
Alternative codes found
RIV/49777513:23520/21:43962009 RIV/68378271:_____/21:00567523
Result on the web
<a href="https://www.sciencedirect.com/science/article/abs/pii/S0042207X21002827?via%3Dihub" target="_blank" >https://www.sciencedirect.com/science/article/abs/pii/S0042207X21002827?via%3Dihub</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2021.110329" target="_blank" >10.1016/j.vacuum.2021.110329</a>
Alternative languages
Result language
angličtina
Original language name
High deposition rate films prepared by reactive HiPIMS
Original language description
High power impulse magnetron sputtering (HiPIMS) is characterized by a very high current density at the target during each pulse. A large fraction of sputtered target material is ionized, which allows the preparation of hard and defect-free coatings. Compared to the conventional sputtering methods, HiPIMS technology possesses a certain drawback, i.e. lower deposition rate. A promising variation, i.e. reactive HiPIMS, was described by a mathematical model (S. Kadlec, J. Čapek, JAP 121 (2017) 171910). One of the fundamental results shows that reactive HiPIMS can deliver higher deposition rates compared to the mid-frequency pulsed dc magnetron sputtering (Mf-PCDMS) due to a lower degree of target poisoning. To confirm these theoretical results, series of experiments were performed in laboratory deposition system with different target materials (Al, Cr, Ti, Zr, Hf, Ta, Nb). Two targets of the same material were employed both in dual Mf-PDCMS (pulse-on/pulse-off time ratio 45:5 μs) and in dual HiPIMS (pulse-on/pulse-off time ratio 25:725 μs) conditions at a fixed power. We confirmed that higher values of the deposition rate for Ta2O5 and Nb2O5 films can be achieved by HiPIMS when operated in the poisoned regime. Finally, we supported our experimental results by Monte-Carlo simulations performed in SRIM and SDTrimSP simulation software.
Czech name
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Czech description
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Classification
Type
J<sub>SC</sub> - Article in a specialist periodical, which is included in the SCOPUS database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
<a href="/en/project/FV30177" target="_blank" >FV30177: Research and development of novel pulsed plasma technologies for deposition of advanced thin-film materials</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Vacuum
ISSN
0042-207X
e-ISSN
1879-2715
Volume of the periodical
191
Issue of the periodical within the volume
September 2021
Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
10
Pages from-to
110329
UT code for WoS article
000679319300003
EID of the result in the Scopus database
2-s2.0-85107435174