High deposition rate films prepared by reactive HiPIMS

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F21%3A43962009" target="_blank" >RIV/49777513:23520/21:43962009 - isvavai.cz</a>
Alternative codes found
RIV/45309787:_____/21:N0000001 RIV/68378271:_____/21:00567523
Result on the web
<a href="https://doi.org/10.1016/j.vacuum.2021.110329" target="_blank" >https://doi.org/10.1016/j.vacuum.2021.110329</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2021.110329" target="_blank" >10.1016/j.vacuum.2021.110329</a>

Result language
angličtina
Original language name
High deposition rate films prepared by reactive HiPIMS
Original language description
Theoretical models indicate that reactive HiPIMS can deliver higher deposition rates compared to the mid-frequency pulsed dc magnetron sputtering (Mf-PDCMS) due to a lower degree of target poisoning. To confirm these theoretical results, series of experiments were performed in laboratory deposition system with different target materials (Al, Cr, Ti, Zr, Hf, Ta, Nb). Two targets of the same material were employed both in dual Mf-PDCMS and in dual HiPIMS conditions at a fixed power. It is confirmed that higher values of the deposition rate for Ta2O5 and Nb2O5 films can be achieved by HiPIMS when operated in the poisoned regime. The experimental results are supported by Monte-Carlo simulations performed in SRIM and SDTrimSP simulation software.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films

Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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