The role of internal plasma parameters on carbon nanotubes growth in plasma enhanced hot filament CVD

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24210%2F02%3A24210030" target="_blank" >RIV/46747885:24210/02:24210030 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

The role of internal plasma parameters on carbon nanotubes growth in plasma enhanced hot filament CVD

Original language description

Aligned CNT have been successfully synthesized from methane, argon and hydrogen mixtures by plasma enhanced hot filament CVD on different substrates. In order to inspect the behaviour of the plasma produced with the DC-bias and its role on the aligned growth of the nanotubes, the internal plasma parameters were measured by Langmuir probes and OES techniques. Our experiments confirmed that the presence both of the plasma and the bias are necessary for formation of aligned nanotubes in the dual hot-wire/dc-bias deposition reactor. Several hypotheses about the role of the electrical field on the alignment of the nanotubes will be discussed.

Czech name

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Czech description

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Type

M - Conference organization

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2002

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Event location

Amsterdam

Event country

NL - THE KINGDOM OF THE NETHERLANDS

Event starting date

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Event ending date

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Total number of attendees

30

Foreign attendee count

5

Type of event by attendee nationality

EUR - Evropská akce