The influence of Kanthal wire surface defects on the formation of Si nanolayer deposited by PVD method

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F46747885%3A24210%2F18%3A00005644" target="_blank" >RIV/46747885:24210/18:00005644 - isvavai.cz</a>

Result on the web

<a href="https://content.sciendo.com/view/journals/msp/36/2/article-p264.xml" target="_blank" >https://content.sciendo.com/view/journals/msp/36/2/article-p264.xml</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1515/msp-2018-0038" target="_blank" >10.1515/msp-2018-0038</a>

Result language

angličtina

Original language name

The influence of Kanthal wire surface defects on the formation of Si nanolayer deposited by PVD method

Original language description

he subject of this research is the structure of a Si nanolayer deposited on a FeCrAl wire surface by means of magnetron sputtering method. Si layer was selected as one of possible protections of the wire surface against excessive corrosive-erosive wear. In order to increase the power necessary for the DC discharge of the magnetron with Si cathode, a second magnetron with an aluminum disc as a cathode was used. The wire was attached to a carousel holder to ensure its rotation around the magnetron. The thickness of the deposited layers was about 150 nm. A wire surface examination indicated the presence of defects such as gaps between grains, cavities as well as severely deformed grains of surface layer. The research was conducted on the sample sections which had been prepared by focused ion beam method (FIB). The technique of transmission microscopy, which was used for observation, allowed us to obtain images in bright field (BF), dark field (DF), as well as in high resolution (HREM). The studies were also performed on the wire surface after the cutting process of the expanded polystyrene blocks. A metallographic optical microscope Nikon MA200 with a large depth of field was used for the examination which showed the presence of carbon deposit products. Additionally, a composition microanalysis was carried out along the line within selected areas of samples, with the use of energy dispersive spectroscopy (EDS). A large impact of wire surface defects on Si layer forming was found as well as a high direct homogeneous growth. The examination of the sections indicated the existence of a mechanism of defects sealed by Si layer, where directionality of grains growth in these areas revealed the tendency for vertical location relative to defects surface. Consequently, closed nanopores, i.e. spaces not covered with Si layer, were created. It is a characteristic feature of areas with defects covered with an oxide film created in a natural way.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

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OECD FORD branch

20500 - Materials engineering

Project

—

Continuities

S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2018

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Materials Science-Poland

ISSN

2083-1331

e-ISSN

—

Volume of the periodical

36

Issue of the periodical within the volume

2

Country of publishing house

PL - POLAND

Number of pages

6

Pages from-to

264-269

UT code for WoS article

000442630200013

EID of the result in the Scopus database

2-s2.0-85058213301