XRD real structure characterization of sputtered Au films different in thickness

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23210%2F11%3A43895750" target="_blank" >RIV/49777513:23210/11:43895750 - isvavai.cz</a>
Alternative codes found
RIV/49777513:23640/11:43895750
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
XRD real structure characterization of sputtered Au films different in thickness
Original language description
The thin gold films were prepared by DC plasma sputtering in argon atmosphere on glass substrates with different sputtering times. On experimental samples with thicknesses from 10 to 90 nm the XRD structural analysis was carried out in order to observe the real structure changes in dependence on the film thickness. The XRD analysis included calcula-tion of lattice parameters, biaxial stress and size of the crystallites and micro-strains. A sim-ple evaluation of preferred orientation of crystallites perpendicular to the sample surface using the integral intensities ratio of two strongest diffraction lines was also performed. The results show strong dependence of all parameters on thickness of Au films. The size of the crystallites is linearly increasingwith growing film thickness whereas the lattice parameter is decreasing. The course of micro-strain and biaxial lattice stress is rapidly changing with increasing thickness of gold films due to relaxation of the structure.
Czech name
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Czech description
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Project
<a href="/en/project/GA106%2F09%2F0125" target="_blank" >GA106/09/0125: Preparation and characterization of metal/polymer structures</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach

Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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