XRD real structure characterization of sputtered Au films different in thickness

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F60461373%3A22310%2F11%3A43893001" target="_blank" >RIV/60461373:22310/11:43893001 - isvavai.cz</a>

Result on the web

<a href="http://dx.doi.org/10.1524/zkpr.2011.0032" target="_blank" >http://dx.doi.org/10.1524/zkpr.2011.0032</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1524/zkpr.2011.0032" target="_blank" >10.1524/zkpr.2011.0032</a>

Result language

angličtina

Original language name

XRD real structure characterization of sputtered Au films different in thickness

Original language description

The thin gold films were prepared by DC plasma sputtering in argon atmosphere on glass substrates with different sputtering times. On experimental samples with thicknesses from 10 to 90 nm the XRD structural analysis was carried out in order to observe the real structure changes in dependence on the film thickness. The XRD analysis included calcula-tion of lattice parameters, biaxial stress and size of the crystallites and micro-strains. A sim-ple evaluation of preferred orientation of crystallites perpendicular to the sample surface using the integral intensities ratio of two strongest diffraction lines was also performed. The results show strong dependence of all parameters on thickness of Au films. The size of the crystallites is linearly increasingwith growing film thickness whereas the lattice parameter is decreasing. The course of micro-strain and biaxial lattice stress is rapidly changing with increasing thickness of gold films due to relaxation of the structure.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

CD - Macromolecular chemistry

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2011

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Zeitschrift für Kristallographie Proceedings

ISSN

1869-1315

e-ISSN

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Volume of the periodical

Neuveden

Issue of the periodical within the volume

1

Country of publishing house

DE - GERMANY

Number of pages

6

Pages from-to

215-220

UT code for WoS article

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EID of the result in the Scopus database

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