Relationship between structure and mechanical properties in hard Al-Si-Cu-N films prepared by magnetron sputtering

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F02%3A00070764" target="_blank" >RIV/49777513:23520/02:00070764 - isvavai.cz</a>

Alternative codes found

RIV/49777513:23520/02:00000327 RIV/49777513:23520/02:00000328 RIV/49777513:23520/02:00000329

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Relationship between structure and mechanical properties in hard Al-Si-Cu-N films prepared by magnetron sputtering

Original language description

This article reports on properties of Al-Si-Cu-N films with 5-9 at.% Cu magnetron sputtered from a composed (Al, Si)-Cu target. The demonstration of a possibility to form the X-ray amorphous superhard films is of key scientific importance. It makes possible to start investigation of the grain size dependent phenomena in nanostructured films prepared by two-step process based on nanocrystallization from amorphous phase using a post-deposition annealing.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2002

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Thin Solid Films

ISSN

00406090

e-ISSN

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Volume of the periodical

Vol. 413

Issue of the periodical within the volume

č. 1-2

Country of publishing house

US - UNITED STATES

Number of pages

10

Pages from-to

121

UT code for WoS article

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EID of the result in the Scopus database

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