Low-stress superhard Ti-B prepared by magnetron sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F03%3A00000138" target="_blank" >RIV/49777513:23520/03:00000138 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Low-stress superhard Ti-B prepared by magnetron sputtering
Original language description
The article reports on structure and mechanical properties of Ti-B alloy films sputter deposited from a sintered TiB2 target using and unbalanced dc magnetron. We present results of systamatic investigation of the effect of negative substrate bias Us, substrate ion current density is, and substrate temperature Ts, on properties of Ti-B films. The X-ray diffraction analysis shows that Ti-B films consist of the hexagonal TiB2 phase with the typical texture only.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ME%20173" target="_blank" >ME 173: Magnetron sputtering of thin films</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2003
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surface and Coatings Technology
ISSN
0257-8972
e-ISSN
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Volume of the periodical
174-175
Issue of the periodical within the volume
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Country of publishing house
NL - THE KINGDOM OF THE NETHERLANDS
Number of pages
10
Pages from-to
744-753
UT code for WoS article
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EID of the result in the Scopus database
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