Influence of silicon, oxygen and nitrogen admixtures upon the properties of plasma deposited amorphous diamond-like carbon coatings

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F06%3A00000486" target="_blank" >RIV/49777513:23520/06:00000486 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Influence of silicon, oxygen and nitrogen admixtures upon the properties of plasma deposited amorphous diamond-like carbon coatings

Original language description

Amorphous diamond-like carbon films (DLC) with various silicon, oxygen and nitrogen content were deposited by plasma enhanced chemical vapor deposition (PECVD) technique. A combination of RBS, ERDA, FTIR and XPS methods was used to study the films´ chemical composition and structure. The mechanical properties were studied using a depth sensing indentation technique.

Czech name

Vliv křemíku, kyslíku a dusíku na vlastnosti plazmou deponovaných amorfních DLC vrstev

Czech description

Amorfní DLC vrstvy s různým obsahem Si, O2 a N2 byly deponovány procesem PECVD. Vrstvy byly hodnoceny metodami RBS, ERDA, FTIR a XPS. Mechanické vlastnosti byly hodnoceny nanoindentační metodou.

Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

JJ - Other materials

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2006

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Journal of Advanced Oxidation Technologies

ISSN

1203-8407

e-ISSN

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Volume of the periodical

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Issue of the periodical within the volume

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Country of publishing house

CA - CANADA

Number of pages

5

Pages from-to

232

UT code for WoS article

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EID of the result in the Scopus database

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