Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F09%3A00501523" target="_blank" >RIV/49777513:23520/09:00501523 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Electron energy distributions and plasma parameters in high-power pulsed magnetron sputtering discharges

Original language description

We report on the results obtained using time-resolved Langmuir probe measurements in high-power pulsed dc magnetron sputtering discharges. Time evolutions of the electron energy distribution and the local plasma parameters were investigated at a substrate position of 100mm from a planar target of 100mm diameter during a high-rate deposition of copper films. High plasma densities were achieved and the electron energy distributions with two energy groups and sharply truncated high-energy tails were observed.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

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Continuities

Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year

2009

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Plasma Sources Science and Technology

ISSN

0963-0252

e-ISSN

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Volume of the periodical

18

Issue of the periodical within the volume

2

Country of publishing house

GB - UNITED KINGDOM

Number of pages

7

Pages from-to

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UT code for WoS article

000265580800011

EID of the result in the Scopus database

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