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Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F11%3A43898421" target="_blank" >RIV/49777513:23520/11:43898421 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.1002/ppap.201000131" target="_blank" >http://dx.doi.org/10.1002/ppap.201000131</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1002/ppap.201000131" target="_blank" >10.1002/ppap.201000131</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films

  • Original language description

    Pulsed dc dual magnetron sputtering was used for preparation of photocatalytic crystalline TiO2 films. Both magnetrons operated in the asymmetric bipolar mode at the repetition frequency of 100 kHz. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. A suppression of high-energy ions in the flux onto the substrate resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO2 films.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/OC10045" target="_blank" >OC10045: Novel plasma sources for film deposition and surface modification</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2011

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Plasma Processes and Polymers

  • ISSN

    1612-8850

  • e-ISSN

  • Volume of the periodical

    8

  • Issue of the periodical within the volume

    3

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    9

  • Pages from-to

    191-199

  • UT code for WoS article

    000289024800002

  • EID of the result in the Scopus database