Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F11%3A43898421" target="_blank" >RIV/49777513:23520/11:43898421 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1002/ppap.201000131" target="_blank" >http://dx.doi.org/10.1002/ppap.201000131</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/ppap.201000131" target="_blank" >10.1002/ppap.201000131</a>

Result language
angličtina
Original language name
Ion Flux Characteristics in Pulsed Dual Magnetron Discharges Used for Deposition of Photoactive TiO2 Films
Original language description
Pulsed dc dual magnetron sputtering was used for preparation of photocatalytic crystalline TiO2 films. Both magnetrons operated in the asymmetric bipolar mode at the repetition frequency of 100 kHz. Time-averaged energy-resolved mass spectroscopy was performed at a substrate position located 100 mm from the targets. A suppression of high-energy ions in the flux onto the substrate resulted in a strong predominance of the highly photoactive crystalline anatase phase in the TiO2 films.
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
<a href="/en/project/OC10045" target="_blank" >OC10045: Novel plasma sources for film deposition and surface modification</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Publication year
2011
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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