Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F15%3A43924833" target="_blank" >RIV/49777513:23520/15:43924833 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.vacuum.2014.12.004" target="_blank" >http://dx.doi.org/10.1016/j.vacuum.2014.12.004</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2014.12.004" target="_blank" >10.1016/j.vacuum.2014.12.004</a>

Result language
angličtina
Original language name
Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films
Original language description
High-power impulse magnetron sputtering with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified, highly optically transparent, stoichiometric ZrO2 films onto floating substrates. The depositions were performed using a strongly unbalanced magnetron with a directly water-cooled planar Zr target of 100 mm diameter in argon-oxygen gas mixtures. An optimized location of the oxygen gas inlets in front of the target and their orientation toward the substrate made it possible to improve the quality of the films due to minimized arcing at the sputtered target and to enhance their deposition rates up to 120 nm/min. The films exhibited a hardness of 16 GPa, a refractive index of 2.19 and an extinction coefficientof 2x10-3 (both at the wavelength of 550 nm). Under these optimized conditions, we measured the highest (Zr+ + Zr2+) and (O2+ + O+) ion fractions in the total fluxes of positive ions, and a low population of high-energy O- ions at the sub
Czech name
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Czech description
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Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Project
<a href="/en/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2015
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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