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High-Rate Reactive High-Power Impulse Magnetron Sputter Deposition: Principles and Applications

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F16%3A43949524" target="_blank" >RIV/49777513:23520/16:43949524 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.14332/svc16.proc.0017" target="_blank" >http://dx.doi.org/10.14332/svc16.proc.0017</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.14332/svc16.proc.0017" target="_blank" >10.14332/svc16.proc.0017</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    High-Rate Reactive High-Power Impulse Magnetron Sputter Deposition: Principles and Applications

  • Original language description

    High-power impulse magnetron sputtering with a pulsed reactive gas flow control was used for high-rate reactive depositions of densified, highly optically transparent, stoichiometric ZrO2 and HfO2 films on floating substrates. The depositions were performed using a strongly unbalanced magnetron with a planar Zr and Hf target of 100 mm diameter in argon-oxygen gas mixtures at the total pressure close to 2 Pa. The repetition frequency was 500 Hz at the deposi¬tion-averaged target power density close to 30 W/cm^2 and 50 W/cm^2 with voltage pulse durations ranged from 50 μs to 200 μs (the duty cycles from 2.5% to 10%). The target-to-substrate distance was 100 mm. For the same duty cycle of 10%, the deposition rates were up to 120 nm/min for the ZrO2 films and even up to 345 nm/min for the HfO2 films. An effective feedback pulsed reactive gas flow control and a simplified relation for the deposition rate of films prepared using a reactive high-power impulse magnetron sputtering are presented.

  • Czech name

  • Czech description

Classification

  • Type

    D - Article in proceedings

  • CEP classification

  • OECD FORD branch

    20506 - Coating and films

Result continuities

  • Project

    <a href="/en/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2016

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Article name in the collection

    SOCIETY OF VACUUM COATERS 59TH ANNUAL TECHNICAL CONFERENCE PROCEEDINGS, 2016

  • ISBN

    978-1-878068-36-1

  • ISSN

    0737-5921

  • e-ISSN

    neuvedeno

  • Number of pages

    5

  • Pages from-to

    135-139

  • Publisher name

    SOCIETY OF VACUUM COATERS

  • Place of publication

    ALBUQUERQUE, NM 87122-1914 USA

  • Event location

    Indianapolis, Indiana

  • Event date

    May 9, 2016

  • Type of event by nationality

    WRD - Celosvětová akce

  • UT code for WoS article

    000405161400019