High-Rate Reactive High-Power Impulse Magnetron Sputter Deposition: Principles and Applications
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F16%3A43949524" target="_blank" >RIV/49777513:23520/16:43949524 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.14332/svc16.proc.0017" target="_blank" >http://dx.doi.org/10.14332/svc16.proc.0017</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.14332/svc16.proc.0017" target="_blank" >10.14332/svc16.proc.0017</a>
Alternative languages
Result language
angličtina
Original language name
High-Rate Reactive High-Power Impulse Magnetron Sputter Deposition: Principles and Applications
Original language description
High-power impulse magnetron sputtering with a pulsed reactive gas flow control was used for high-rate reactive depositions of densified, highly optically transparent, stoichiometric ZrO2 and HfO2 films on floating substrates. The depositions were performed using a strongly unbalanced magnetron with a planar Zr and Hf target of 100 mm diameter in argon-oxygen gas mixtures at the total pressure close to 2 Pa. The repetition frequency was 500 Hz at the deposi¬tion-averaged target power density close to 30 W/cm^2 and 50 W/cm^2 with voltage pulse durations ranged from 50 μs to 200 μs (the duty cycles from 2.5% to 10%). The target-to-substrate distance was 100 mm. For the same duty cycle of 10%, the deposition rates were up to 120 nm/min for the ZrO2 films and even up to 345 nm/min for the HfO2 films. An effective feedback pulsed reactive gas flow control and a simplified relation for the deposition rate of films prepared using a reactive high-power impulse magnetron sputtering are presented.
Czech name
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Czech description
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Classification
Type
D - Article in proceedings
CEP classification
—
OECD FORD branch
20506 - Coating and films
Result continuities
Project
<a href="/en/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Article name in the collection
SOCIETY OF VACUUM COATERS 59TH ANNUAL TECHNICAL CONFERENCE PROCEEDINGS, 2016
ISBN
978-1-878068-36-1
ISSN
0737-5921
e-ISSN
neuvedeno
Number of pages
5
Pages from-to
135-139
Publisher name
SOCIETY OF VACUUM COATERS
Place of publication
ALBUQUERQUE, NM 87122-1914 USA
Event location
Indianapolis, Indiana
Event date
May 9, 2016
Type of event by nationality
WRD - Celosvětová akce
UT code for WoS article
000405161400019