High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F16%3A43928550" target="_blank" >RIV/49777513:23520/16:43928550 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1016/j.surfcoat.2015.08.024" target="_blank" >http://dx.doi.org/10.1016/j.surfcoat.2015.08.024</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.surfcoat.2015.08.024" target="_blank" >10.1016/j.surfcoat.2015.08.024</a>
Alternative languages
Result language
angličtina
Original language name
High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films
Original language description
High-power impulse magnetron sputtering (HiPIMS) with a pulsed reactive gas (oxygen) flow control was used for high-rate reactive depositions of densified, highly optically transparent, stoichiometric HfO2 films onto floating substrates. The depositions were performed using a strongly unbalanced magnetron with a directly water-cooled planar Hf target of 100 mm diameter in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at the deposition-averaged target power density from 29 W/cm^2 to 54 W/cm^2. The voltage pulse durations ranged from 50 ?s to 200 ?s. The target-to-substrate distance was 100 mm and the substrate temperatures were less than 165 oC. We showed that the HfO2 films can be prepared with very high deposition rates (up to 200 nm/min) even at a deposition-averaged target power density of approximately 30 W/cm^2, which is relatively close to a target power density applicable in industrial HiPIMS systems. The films were nanocrystalline with a dominant monoclinic phase. They exhibited a hardness of 15-18 GPa, a refractive index of 2.07-2.12 and an extinction coefficient between LESS-THAN OR EQUAL TO 0.0001 and 0.0006 (both quantities at the wavelength of 550 nm). At 300 nm, the extinction coefficient was between 0.0015 and 0.007. A simplified relation for the deposition rate of films prepared using a reactive HiPIMS was presented.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
<a href="/en/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2016
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surface & Coatings Technology
ISSN
0257-8972
e-ISSN
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Volume of the periodical
290
Issue of the periodical within the volume
25 March 2016
Country of publishing house
CH - SWITZERLAND
Number of pages
7
Pages from-to
58-64
UT code for WoS article
000374370600010
EID of the result in the Scopus database
2-s2.0-84939629398