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Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43931481" target="_blank" >RIV/49777513:23520/17:43931481 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.1063/1.4977822" target="_blank" >http://dx.doi.org/10.1063/1.4977822</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1063/1.4977822" target="_blank" >10.1063/1.4977822</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering

  • Original language description

    Time-resolved optical emission spectroscopy was performed near the sputtered Zr target and in a plasma bulk during a controlled high-rate reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at the deposition-averaged target power density of 52 W/cm^2 with a peak target power density of 1100 W/cm^2. The voltage pulse duration was 200 µs. From the time evolutions of the excited-state populations for the chosen atoms (Zr, Ar, and O) and ions (Zr+, Zr2+, Ar+, and O+), and of the excitation temperature during a voltage pulse, the trends in a time evolution of the local ground-state densities of these atoms and ions during the voltage pulse were derived. Near the target, a decrease in the ground-state densities of Ar and O atoms, caused by a gas rarefaction and intense electron-impact ionization, was observed in the first half of the voltage pulse. Simultaneous, very effective electron-impact ionization of sputtered Zr atoms was proved. A composition of particle fluxes onto the substrate during a film deposition was found almost independent of the instantaneous oscillating oxygen partial pressure.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database

  • CEP classification

  • OECD FORD branch

    10305 - Fluids and plasma physics (including surface physics)

Result continuities

  • Project

    <a href="/en/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2017

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Journal of Applied Physics

  • ISSN

    0021-8979

  • e-ISSN

  • Volume of the periodical

    121

  • Issue of the periodical within the volume

    17

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    11

  • Pages from-to

    „171908-1“-„171908-11“

  • UT code for WoS article

    000400623700010

  • EID of the result in the Scopus database

    2-s2.0-85014919923