Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F17%3A43931481" target="_blank" >RIV/49777513:23520/17:43931481 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1063/1.4977822" target="_blank" >http://dx.doi.org/10.1063/1.4977822</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/1.4977822" target="_blank" >10.1063/1.4977822</a>
Alternative languages
Result language
angličtina
Original language name
Optical emission spectroscopy during the deposition of zirconium dioxide films by controlled reactive high-power impulse magnetron sputtering
Original language description
Time-resolved optical emission spectroscopy was performed near the sputtered Zr target and in a plasma bulk during a controlled high-rate reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films in argon-oxygen gas mixtures at the argon pressure of 2 Pa. The repetition frequency was 500 Hz at the deposition-averaged target power density of 52 W/cm^2 with a peak target power density of 1100 W/cm^2. The voltage pulse duration was 200 µs. From the time evolutions of the excited-state populations for the chosen atoms (Zr, Ar, and O) and ions (Zr+, Zr2+, Ar+, and O+), and of the excitation temperature during a voltage pulse, the trends in a time evolution of the local ground-state densities of these atoms and ions during the voltage pulse were derived. Near the target, a decrease in the ground-state densities of Ar and O atoms, caused by a gas rarefaction and intense electron-impact ionization, was observed in the first half of the voltage pulse. Simultaneous, very effective electron-impact ionization of sputtered Zr atoms was proved. A composition of particle fluxes onto the substrate during a film deposition was found almost independent of the instantaneous oscillating oxygen partial pressure.
Czech name
—
Czech description
—
Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
—
OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
<a href="/en/project/GA14-03875S" target="_blank" >GA14-03875S: Nanostructured multifunctional coatings prepared using highly ionized pulsed plasmas</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2017
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Applied Physics
ISSN
0021-8979
e-ISSN
—
Volume of the periodical
121
Issue of the periodical within the volume
17
Country of publishing house
US - UNITED STATES
Number of pages
11
Pages from-to
„171908-1“-„171908-11“
UT code for WoS article
000400623700010
EID of the result in the Scopus database
2-s2.0-85014919923