Effects of power per pulse on reactive HiPIMS deposition of ZrO2 ﬁlms: A time-resolved optical emission spectroscopy study

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F19%3A43956580" target="_blank" >RIV/49777513:23520/19:43956580 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1116/1.5125721" target="_blank" >https://doi.org/10.1116/1.5125721</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1116/1.5125721" target="_blank" >10.1116/1.5125721</a>

Result language
angličtina
Original language name
Effects of power per pulse on reactive HiPIMS deposition of ZrO2 ﬁlms: A time-resolved optical emission spectroscopy study
Original language description
Time-resolved optical emission spectroscopy was carried out during controlled reactive high-power impulse magnetron sputtering of ZrO2 films in argon-oxygen gas mixtures. The effects of increased target power density applied in voltage pulses shortened from 200 to 50 μs were studied. It was found that the sputtered Zr atoms are much more ionized and the Ar atom density is more decreased near the target during the shorter (50 μs) high-power pulses. The higher backward flux of the Zr ions onto the target during this high-power discharge regime contributed significantly to a 34% decrease in the efficiency of the magnetron sputter deposition of ZrO2 films.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films

Project
<a href="/en/project/GA17-08944S" target="_blank" >GA17-08944S: Nanostructured coatings synthesized using highly reactive pulsed plasmas</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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