Irradiation of sputtered Al–Si–N coatings by pulsed 200 keV C+ ion beam

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F18%3A43952918" target="_blank" >RIV/49777513:23520/18:43952918 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1016/j.vacuum.2018.09.022" target="_blank" >https://doi.org/10.1016/j.vacuum.2018.09.022</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2018.09.022" target="_blank" >10.1016/j.vacuum.2018.09.022</a>

Result language
angličtina
Original language name
Irradiation of sputtered Al–Si–N coatings by pulsed 200 keV C+ ion beam
Original language description
This paper reports on the effect of the irradiation of Al–Si–N coatings by an intense pulsed ion beam. The Al–Si–N coating was deposited on a steel substrate by a reactive magnetron sputtering. The Al–Si–N coating with a high silicon content (30 at.%) was irradiated by a high-intense pulsed C+ ion beam. It was shown that metastable growth defects (GDs) created in the Al–Si–N coating during deposition can be healed up by its post-deposition irradiation using several pulses (1 and 10) of C+ ions with energy Ei = 200 keV, ion current density is = 7 A/cm^2, pulse duration tp = 110 ns and radiation dose 2 MGy. The reduction in deposition-induced GD density results in an increased transmittance of the Al–Si–N coatings.
Czech name
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Czech description
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Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films

Project
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Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year
2018
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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