Effect of positive pulse voltage in bipolar reactive HiPIMS on crystal structure, microstructure and mechanical properties of CrN films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F20%3A43958585" target="_blank" >RIV/49777513:23520/20:43958585 - isvavai.cz</a>

Result on the web

<a href="https://doi.org/10.1016/j.surfcoat.2020.125773" target="_blank" >https://doi.org/10.1016/j.surfcoat.2020.125773</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2020.125773" target="_blank" >10.1016/j.surfcoat.2020.125773</a>

Result language

angličtina

Original language name

Effect of positive pulse voltage in bipolar reactive HiPIMS on crystal structure, microstructure and mechanical properties of CrN films

Original language description

CrN films were prepared using three different configurations of the HiPIMS discharge mode and the substrate holder potential. We investigate the effect of a positive pulse voltage (30–400 V) in bipolar HiPIMS on the crystal structure, microstructure and resulting mechanical properties of the films, and compare it to the effect of a standard DC bias voltage applied to the substrate holder in unipolar HiPIMS. We find that when the substrate holder is at a floating potential, its charging causes the loss of the plasma-substrate potential difference, necessary for ion acceleration, and no obvious evolution is thus observed with increasing positive pulse voltage. However, when the substrate holder is grounded, the effect of the positive pulse voltage is apparent and different from the effect of the DC bias substrate voltage. That is mainly due to differences in energies delivered into the growing film by bombarding ions. Films prepared using bipolar HiPIMS at a positive pulse voltage of 90 and 120 V exhibit the most interesting properties, namely high hardness (23.5 and 23.1 GPa, respectively) at a relatively low residual compressive stress (1.7 and 1.5 GPa, respectively). The results indicate that as long as the growing film is conductively connected with the ground, bipolar HiPIMS is a suitable method to tailor and improve the film properties.

Czech name

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Czech description

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Type

J_imp - Article in a specialist periodical, which is included in the Web of Science database

CEP classification

—

OECD FORD branch

20506 - Coating and films

Project

<a href="/en/project/FV30177" target="_blank" >FV30177: Research and development of novel pulsed plasma technologies for deposition of advanced thin-film materials</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2020

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

—

Volume of the periodical

393

Issue of the periodical within the volume

15 JUL 2020

Country of publishing house

CH - SWITZERLAND

Number of pages

7

Pages from-to

„125773-1“-„125773-7“

UT code for WoS article

000532676600014

EID of the result in the Scopus database

2-s2.0-85083311659