Tuning the film properties on insulating substrates using multi-pulse bipolar HiPIMS

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43972641" target="_blank" >RIV/49777513:23520/24:43972641 - isvavai.cz</a>

Alternative codes found

RIV/49777513:23520/24:43973132

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Tuning the film properties on insulating substrates using multi-pulse bipolar HiPIMS

Original language description

The introduction of high-power impulse magnetron sputtering (HiPIMS) has brought further possibilities for controlling the deposition process due to the high fraction of ionized species and broadened ion energy distribution function. Recently, bipolar HiPIMS, where the main negative voltage pulse is followed by a positive one, has been suggested to be used instead of a substrate bias voltage. However, this approach is often limited when the plasma-substrate potential difference is lost due to the charging of the insulating substrate. This work proposes to utilize multi-pulse bipolar HiPIMS to facilitate energy delivery to films on insulating substrates.The experiments were performed using a magnetron with a Ti target driven by an in-house built HiPIMS power supply controlled by a two-channel waveform generator. This configuration allowed us to investigate discharge conditions including standard HiPIMS, standard bipolar HiPIMS, and several non-standard variations of multi-pulse bipolar HiPIMS. Ti films were deposited on insulating substrates, and their properties were analyzed. In addition, ion mass- and energy-spectroscopy analyses were performed to understand the observed phenomena.The carried-out experiments have revealed that the proposed approach provides more possibilities to control the film properties on insulating substrates. Here, the compressive stress of the films increases according to the pulse configuration used. We provide an explanation of the observed behavior based on a longer total time during which the desired positive plasma-substrate potential difference is kept during the multi-pulse HiPIMS. In addition, the carried-out spectroscopy has shown that the multi-pulse approach yields a broader peak with an elevated high-energy tail.

Czech name

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Czech description

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Type

O - Miscellaneous

CEP classification

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OECD FORD branch

20506 - Coating and films

Project

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Continuities

S - Specificky vyzkum na vysokych skolach

Publication year

2024

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů