On bipolar HiPIMS pulse configurations to enhance energy and ion flux to insulating substrates
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43973133" target="_blank" >RIV/49777513:23520/24:43973133 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
On bipolar HiPIMS pulse configurations to enhance energy and ion flux to insulating substrates
Original language description
High-power impulse magnetron sputtering (HiPIMS) offers enhanced ionization for thin film deposition but struggles with low-energy ions. Bipolar HiPIMS, using alternating negative and positive pulses, presents a potential solution, especially for films on insulating substrates where surface charging is an issue. This study investigates optimizing bipolar HiPIMS pulse configurations, comparing unipolar and multi-pulse setups under different magnetic fields. Results show that bipolar HiPIMS introduces a high-energy ion peak, with the multi-pulse configuration broadening this peak and affecting film structure, despite a slight reduction in ion flux. Time-resolved measurements further highlight the evolution of energetic ion flux.
Czech name
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Czech description
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Classification
Type
O - Miscellaneous
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
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Continuities
S - Specificky vyzkum na vysokych skolach
Others
Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů