Investigation of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F13%3A00422122" target="_blank" >RIV/68378271:_____/13:00422122 - isvavai.cz</a>

Result on the web

<a href="http://www.sciencedirect.com/science/article/pii/S0257897213004829" target="_blank" >http://www.sciencedirect.com/science/article/pii/S0257897213004829</a>

DOI - Digital Object Identifier

<a href="http://dx.doi.org/10.1016/j.surfcoat.2013.05.038" target="_blank" >10.1016/j.surfcoat.2013.05.038</a>

Result language

angličtina

Original language name

Investigation of reactive HiPIMS + MF sputtering of TiO2 crystalline thin films

Original language description

A hybrid high-power impulse magnetron sputtering (HiPIMS) + mid-frequency (MF) magnetron sputtering system was used for the deposition of crystalline TiO2 thin films at a low substrate temperature. Ion velocity distribution functions were measured in a pulsed magnetron discharge at substrate positions depending on the type of plasma excitation and on theworking gasmixtures. Several different pulsed discharge configurations were used: (i) HiPIMS, (ii) pulsed bipolar MF with frequency 350 kHz and (iii) both HiPIMS + MF connected in parallel to themagnetron cathode. Ti targets were sputtered in three different types of atmospheres: (i) inert pure Ar, (ii) a reactive mixture of Ar + O2 and (iii) a reactive mixture of Ar + O2 + N2 with a constant gas pressure p = 1 Pa. All IVDFs were measured using a time-resolved retarding field energy analyzer (RFEA) located in the substrate position. The thin film properties are discussed with respect to the measured plasma parameters.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BL - Plasma physics and discharge through gases

OECD FORD branch

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Project

Result was created during the realization of more than one project. More information in the Projects tab.

Continuities

I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace

Publication year

2013

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Surface and Coatings Technology

ISSN

0257-8972

e-ISSN

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Volume of the periodical

232

Issue of the periodical within the volume

OCT

Country of publishing house

CH - SWITZERLAND

Number of pages

8

Pages from-to

376-383

UT code for WoS article

000327691300050

EID of the result in the Scopus database

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