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Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F10%3A00351378" target="_blank" >RIV/68378271:_____/10:00351378 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina

  • Original language description

    The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode ofsputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate ?O2, magnetron voltage Ud and constant power Pd=400W deliveredto the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates ?O2=?Ar. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    2010

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Plasma Processes and Polymers

  • ISSN

    1612-8850

  • e-ISSN

  • Volume of the periodical

    7

  • Issue of the periodical within the volume

    11

  • Country of publishing house

    DE - GERMANY

  • Number of pages

    5

  • Pages from-to

  • UT code for WoS article

    000285212000004

  • EID of the result in the Scopus database