Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina
Result description
The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode ofsputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate ?O2, magnetron voltage Ud and constant power Pd=400W deliveredto the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates ?O2=?Ar. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films.
Keywords
aluminium oxideion-energy distribution functionmagnetronmass spectrometrypulsed discharges
The result's identifiers
Result code in IS VaVaI
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Generation of positive and negative oxygen ions in magnetron discharge during reactive sputtering of alumina
Original language description
The paper is devoted to the investigation of ion composition of plasma of dc pulsed magnetron discharge generated by a magnetron with Al target in an Ar/O2 mixture. The magnetron discharge was investigated in the non-reactive, metallic and oxide mode ofsputtering using a mass spectrometer. The amount and energies of neutral oxygen atoms O,positive O+ and O2+ ions, and negative O- and O2- ions were measured as a function of oxygen flow rate ?O2, magnetron voltage Ud and constant power Pd=400W deliveredto the magnetron discharge, repetition frequency of pulses f=10 kHz and the ratio of O2 and Ar flow rates ?O2=?Ar. The content of ions and radicals in magnetron discharge is compared with optical spectroscopy measurements. The obtained results give a deeper insight into reactive magnetron sputtering of oxide films.
Czech name
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Czech description
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Classification
Type
Jx - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
2010
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Processes and Polymers
ISSN
1612-8850
e-ISSN
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Volume of the periodical
7
Issue of the periodical within the volume
11
Country of publishing house
DE - GERMANY
Number of pages
5
Pages from-to
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UT code for WoS article
000285212000004
EID of the result in the Scopus database
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Basic information
Result type
Jx - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP
BM - Solid-state physics and magnetism
Year of implementation
2010