Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F68378271%3A_____%2F23%3A00573076" target="_blank" >RIV/68378271:_____/23:00573076 - isvavai.cz</a>
Result on the web
<a href="https://hdl.handle.net/11104/0346388" target="_blank" >https://hdl.handle.net/11104/0346388</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1361-6595/acd5fc" target="_blank" >10.1088/1361-6595/acd5fc</a>
Alternative languages
Result language
angličtina
Original language name
Pulse length dependence of a reactive high power impulse magnetron (HiPIMS) discharge
Original language description
The pulse length dependence of a reactive high power impulse magnetron sputtering (HiPIMS) discharge with a tungsten cathode in an argon+oxygen gas mixture gas was investigated. The HiPIMS discharge is operated with a variable pulse length of 20–500 μs. Discharge current measurements, optical emission spectroscopy of neutral Ar, O, and W lines, and energy-resolved ion mass spectrometry are employed. A pronounced dependence of the discharge current on pulse length is noted while the initial discharge voltage is maintained constant. Energy-resolved mass spectrometry shows that the oxygen-to-tungsten (O+/W+) and the tungsten oxide-to-tungsten (WO+/W+) ion ratio decreases with pulse length due to target cleaning. Simulation results employing the SDTrimSP program show the formation of a non-stoichiometric sub-surface compound layer of oxygen which depends on the impinging ion composition and thus on the pulse length.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2023
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Sources Science & Technology
ISSN
0963-0252
e-ISSN
1361-6595
Volume of the periodical
32
Issue of the periodical within the volume
5
Country of publishing house
US - UNITED STATES
Number of pages
12
Pages from-to
055013
UT code for WoS article
000999940400001
EID of the result in the Scopus database
2-s2.0-85161561200