Nanostructured CuO/WO3 thin films for Hydrogen Gas Sensing Prepared by Advanced Magnetron Sputtering Techniques

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F21%3A43963136" target="_blank" >RIV/49777513:23520/21:43963136 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Nanostructured CuO/WO3 thin films for Hydrogen Gas Sensing Prepared by Advanced Magnetron Sputtering Techniques
Original language description
Various architectures of hydrogen sensing multilayers were designed using various combinations of thin films and nanoclusters of both CuO and WO3. Thin films were prepared using reactive sputter deposition in dc magnetron regime (WO3) or rf mode (CuO). The nanoclusters were prepared by magnetron-based gas aggregation cluster source which enabled controlling of size and composition of clusters. There are several architectures described in this work. The combination of two thin films. Decoration of one support film with clusters or thin films overlaying the clusters. By switching the materials in these configurations, various nanostructures were achieved. The sensorial behavior of prepared materials was studied towards hydrogen gas in synthetic air in a form of thin-film conductometric sensor. The enhancement of the response of WO3 thin film alone by adding the CuO film on top is described as well as the influence of the amount of nanoclusters deposited on WO3 thin films. On the basis of the SEM imaging, sensorial behavior analysis, XRD and resistivity measurements, we propose that the sensing mechanism is always based on the formation of heterojunction in between n-type WO3, p-type CuO or other phases present in the structures (such as n-type CuWO4).
Czech name
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Czech description
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Publication year
2021
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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