Sputter deposited CuO-WO3 Nanostructures for Gas Sensing Application

Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43973140" target="_blank" >RIV/49777513:23520/24:43973140 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Result language
angličtina
Original language name
Sputter deposited CuO-WO3 Nanostructures for Gas Sensing Application
Original language description
Combining two or more nanostructured materials is one of the propitious ways to improve the performance of towards various applications. In this work, we have synthesized a system of multiple nanostructured Metal-oxide Semiconductor (MOS) and used them further as conductometric gas sensors. We have prepared nanoclusters of cupric oxide (CuO) by a magnetron-based gas aggregation cluster source (GAS) on/under ultra-thin film of tungsten oxide (WO3). The combination of CuO nanoclusters and WO3 ultrathin film also leads to formation of nanolayer of a ternary oxide material, CuWO4.The sensing property of the prepared system is investigated towards various gases. The synergy of these materials significantly enhances the sensing performance for various gases. On the basis of characterization such as SEM, XRD, Raman, and sensing property, we propose that the sensing mechanism is based on the formation of multiple p-n and n-n type nano-junctions at the interface of CuO nanoclusters, CuWO4 and WO3 ultra-thin films.
Czech name
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Czech description
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Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

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