Controlled sputter deposition of oxide nanoparticles-based composite thin films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F24%3A43971221" target="_blank" >RIV/49777513:23520/24:43971221 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1016/j.surfcoat.2023.130325" target="_blank" >https://doi.org/10.1016/j.surfcoat.2023.130325</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.surfcoat.2023.130325" target="_blank" >10.1016/j.surfcoat.2023.130325</a>
Alternative languages
Result language
angličtina
Original language name
Controlled sputter deposition of oxide nanoparticles-based composite thin films
Original language description
This study explores the feasibility of deposition of composite films based on nanoparticles (NPs) using a magnetron-based gas aggregation source of NPs. First, we investigate the deposition conditions and properties of the individual components of the composite films, namely, NPs prepared using Cu and W targets. We thoroughly discuss that the generation of NPs might be more efficient in the Ar atmosphere in the case of W target due to an enhanced direct emission of NP seeds from the target and/or a longer lifetime of the seeds in the plasma. To operate reasonable fluxes of NPs for both targets, O2 was added into the gas mixture. Lower O2 flow rates promote enhanced seed formation of NPs, while higher flow rates exhibit a dominant target poisoning effect, reducing the flux of NPs. We demonstrate that a fine-tuning of O2 flow rate allows us to control the resulting crystal structure of the NPs. Fully oxidized NPs were produced at O2 flow rates of 1.30 sccm and 1.50 sccm for Cu and W targets, respectively. Subsequently, CuO/WO3 composite films were prepared using our in-house-built software as alternating NPs-based layers. To demonstrate the capabilities of the deposition technique, three different CuO/WO3 multilayers were prepared, each with a specific thickness of the individual layers (80 nm, 40 nm, and 10 nm, which corresponds to a monolayer of NPs). Scanning electron microscopy imaging shows well-defined layers with the intended thickness. In addition, XRD analysis confirms that all three multilayers exhibit practically identical patterns, indicating the same volumetric ratio of CuO and WO3 NPs in the investigated films.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
20506 - Coating and films
Result continuities
Project
<a href="/en/project/EH22_008%2F0004572" target="_blank" >EH22_008/0004572: Quantum materials for applications in sustainable technologies</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>S - Specificky vyzkum na vysokych skolach<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2024
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Surface and Coatings Technology
ISSN
0257-8972
e-ISSN
1879-3347
Volume of the periodical
477
Issue of the periodical within the volume
15 FEB 2024
Country of publishing house
CH - SWITZERLAND
Number of pages
8
Pages from-to
1-8
UT code for WoS article
001149595100001
EID of the result in the Scopus database
2-s2.0-85181767782