On unipolar and bipolar HiPIMS pulse configurations to enhance energy flux to insulating surfaces
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F25%3A43975278" target="_blank" >RIV/49777513:23520/25:43975278 - isvavai.cz</a>
Result on the web
<a href="https://doi.org/10.1088/1361-6595/adbdef" target="_blank" >https://doi.org/10.1088/1361-6595/adbdef</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1088/1361-6595/adbdef" target="_blank" >10.1088/1361-6595/adbdef</a>
Alternative languages
Result language
angličtina
Original language name
On unipolar and bipolar HiPIMS pulse configurations to enhance energy flux to insulating surfaces
Original language description
This study explores the effect of various HiPIMS pulse configurations (unipolar, bipolar, chopped unipolar, and chopped bipolar) to increase energy flux to an insulated surface (e.g., substrate or growing film). The chopped bipolar HiPIMS configuration, featuring several short positive pulses replacing a single long positive pulse, is introduced, and the total energy fluxes are subsequently measured using a passive thermal probe. Moreover, the effect of the probe's capacitance with respect to the ground is systematically investigated by connecting an external capacitor. For surface capacitance in tens of nF, chopping the positive pulse in bipolar HiPIMS effectively increases the energy delivered to the film by discharging the surface in the off-times.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10305 - Fluids and plasma physics (including surface physics)
Result continuities
Project
<a href="/en/project/EH22_008%2F0004572" target="_blank" >EH22_008/0004572: Quantum materials for applications in sustainable technologies</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2025
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Plasma Sources Science & Technology
ISSN
0963-0252
e-ISSN
1361-6595
Volume of the periodical
34
Issue of the periodical within the volume
3
Country of publishing house
GB - UNITED KINGDOM
Number of pages
7
Pages from-to
nestránkováno
UT code for WoS article
001446579400001
EID of the result in the Scopus database
2-s2.0-105000417128