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Structure and microhardness of magnetron sputtered ZrCu and ZrCu-N films

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F99%3A00037950" target="_blank" >RIV/49777513:23520/99:00037950 - isvavai.cz</a>

  • Result on the web

  • DOI - Digital Object Identifier

Alternative languages

  • Result language

    angličtina

  • Original language name

    Structure and microhardness of magnetron sputtered ZrCu and ZrCu-N films

  • Original language description

    The properties of ZrCu and ZrCu-N films magnetron sputtered from an alloyed ZrCu (70/30wt.%) target in Ar+N2 at the same total pressure of 0.7 Pa, respectively, are reported. Zr and Cu are immiscible elements in this composition range resulting in characteristic film properties. A ZrCu film sputter deposited on an unheated substrate was nanocrystalline and characterized by one very broad X-ray reflection line; the substrate temperature Ts up to about 500 C did not affect the ZrCu nanocrystalline structure, but at Ts > 500 C recrystallization process started with a polycrystalline ZrCu film being formed. Addition of nitrogen to the ZrCu film converted the nanocrystalline film to a nanocomposite; and to separate clearly individual phases of this nanocomposite its substrate needed heating. ZrCu/N films sputtered at Ts >= 500 C were nanocomposites composed of Cu and ZrN.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BL - Plasma physics and discharge through gases

  • OECD FORD branch

Result continuities

  • Project

    Result was created during the realization of more than one project. More information in the Projects tab.

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)

Others

  • Publication year

    1999

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Vacuum

  • ISSN

    0042207X

  • e-ISSN

  • Volume of the periodical

    Vol.^52

  • Issue of the periodical within the volume

    1

  • Country of publishing house

    GB - UNITED KINGDOM

  • Number of pages

    7

  • Pages from-to

  • UT code for WoS article

  • EID of the result in the Scopus database