Structure and microhardness of magnetron sputtered ZrCu and ZrCu-N films
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23520%2F99%3A00037950" target="_blank" >RIV/49777513:23520/99:00037950 - isvavai.cz</a>
Result on the web
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DOI - Digital Object Identifier
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Alternative languages
Result language
angličtina
Original language name
Structure and microhardness of magnetron sputtered ZrCu and ZrCu-N films
Original language description
The properties of ZrCu and ZrCu-N films magnetron sputtered from an alloyed ZrCu (70/30wt.%) target in Ar+N2 at the same total pressure of 0.7 Pa, respectively, are reported. Zr and Cu are immiscible elements in this composition range resulting in characteristic film properties. A ZrCu film sputter deposited on an unheated substrate was nanocrystalline and characterized by one very broad X-ray reflection line; the substrate temperature Ts up to about 500 C did not affect the ZrCu nanocrystalline structure, but at Ts > 500 C recrystallization process started with a polycrystalline ZrCu film being formed. Addition of nitrogen to the ZrCu film converted the nanocrystalline film to a nanocomposite; and to separate clearly individual phases of this nanocomposite its substrate needed heating. ZrCu/N films sputtered at Ts >= 500 C were nanocomposites composed of Cu and ZrN.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BL - Plasma physics and discharge through gases
OECD FORD branch
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Result continuities
Project
Result was created during the realization of more than one project. More information in the Projects tab.
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>Z - Vyzkumny zamer (s odkazem do CEZ)
Others
Publication year
1999
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Vacuum
ISSN
0042207X
e-ISSN
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Volume of the periodical
Vol.^52
Issue of the periodical within the volume
1
Country of publishing house
GB - UNITED KINGDOM
Number of pages
7
Pages from-to
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UT code for WoS article
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EID of the result in the Scopus database
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