Structural and optical studies of a-Si:H thin films: From amorphous to nanocrystalline silicon

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F05%3A00503392" target="_blank" >RIV/49777513:23640/05:00503392 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Structural and optical studies of a-Si:H thin films: From amorphous to nanocrystalline silicon

Original language description

We report on the results of the investigation of surface morphology, structure and optical properties of plasma deposited thin films of hydrogenated amorphous silicon determined by atomic force microscopy, X-ray diffraction and UV-Vis and IR spectroscopy. The influence of the both hydrogen dilution of silane plasma in the plasma deposition and the film thickness on the film properties was investigated. The structure, the refractive index and the optical band gap of the dilution series and the thicknessseries were analyzed.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

<a href="/en/project/LN00B084" target="_blank" >LN00B084: Research Centre for New Technologies in the Region of West Bohemia</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2005

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Acta Physica Slovaca

ISSN

0323-0465

e-ISSN

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Volume of the periodical

55

Issue of the periodical within the volume

3

Country of publishing house

SK - SLOVAKIA

Number of pages

9

Pages from-to

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UT code for WoS article

000229323000011

EID of the result in the Scopus database

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