Surface modification of doped ZnO thin films

Result code in IS VaVaI

<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F10%3A00503338" target="_blank" >RIV/49777513:23640/10:00503338 - isvavai.cz</a>

Result on the web

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DOI - Digital Object Identifier

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Result language

angličtina

Original language name

Surface modification of doped ZnO thin films

Original language description

Effects of photo-assisted electrodeless and ion RF-sputter etching on the structural and optical properties of sputtered ZnO:Al thin films were investigated. Photo-assisted electrodeless etching was appropriate for getting ?smooth? surfaces and ion RF-sputter etching by high power has significantly modified the surface roughness with an increase of the light diffuse transmittance.

Czech name

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Czech description

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Type

J_x - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

CEP classification

BM - Solid-state physics and magnetism

OECD FORD branch

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Project

<a href="/en/project/1M06031" target="_blank" >1M06031: Materials and components for environment protection</a><br>

Continuities

P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Publication year

2010

Confidentiality

S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Name of the periodical

Applied Surface Science

ISSN

0169-4332

e-ISSN

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Volume of the periodical

256

Issue of the periodical within the volume

18

Country of publishing house

NL - THE KINGDOM OF THE NETHERLANDS

Number of pages

4

Pages from-to

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UT code for WoS article

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EID of the result in the Scopus database

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