Structural analyses of seeded thin film microcrystalline silicon solar cell
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F14%3A43921760" target="_blank" >RIV/49777513:23640/14:43921760 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1002/pip.2274" target="_blank" >http://dx.doi.org/10.1002/pip.2274</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1002/pip.2274" target="_blank" >10.1002/pip.2274</a>
Alternative languages
Result language
angličtina
Original language name
Structural analyses of seeded thin film microcrystalline silicon solar cell
Original language description
This contribution investigates the effect of seeding the growth of thin film microcrystalline silicon (?c-Si : H) deposited by radio frequency plasma-enhanced chemical vapor deposition on the material properties of ?c-Si : H film and the device performance of p-i-n and n-i-p ?c-Si : H solar cells. By means of Raman measurement, x-ray diffraction (XRD) and transmission electron microscopy (TEM), we investigate the structure of seeded ?c-Si : H. In particular, the effect of seed layers on the crystallinity development is investigated. Measurements of the depth profile of the crystalline mass fraction using Raman spectroscopy show that seed layers lead to a more rapid and uniform crystallinity development in growth direction.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ED2.1.00%2F03.0088" target="_blank" >ED2.1.00/03.0088: Centre of the New Technologies and Materials</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Progress in Photovoltaics: Research and applications
ISSN
1062-7995
e-ISSN
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Volume of the periodical
22
Issue of the periodical within the volume
3
Country of publishing house
US - UNITED STATES
Number of pages
10
Pages from-to
346-355
UT code for WoS article
000331334400007
EID of the result in the Scopus database
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