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Finite-thickness effect on crystallization kinetics in thin films and its adaptation in the Johnson-Mehl-Avrami-Kolmogorov model

The result's identifiers

  • Result code in IS VaVaI

    <a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F14%3A43922004" target="_blank" >RIV/49777513:23640/14:43922004 - isvavai.cz</a>

  • Result on the web

    <a href="http://dx.doi.org/10.1063/1.4862858" target="_blank" >http://dx.doi.org/10.1063/1.4862858</a>

  • DOI - Digital Object Identifier

    <a href="http://dx.doi.org/10.1063/1.4862858" target="_blank" >10.1063/1.4862858</a>

Alternative languages

  • Result language

    angličtina

  • Original language name

    Finite-thickness effect on crystallization kinetics in thin films and its adaptation in the Johnson-Mehl-Avrami-Kolmogorov model

  • Original language description

    The Johnson-Mehl-Avrami-Kolmogorov (JMAK) model is widely used to quantify the isothermal crystallization kinetics. The present work reports an analytical solution for the crystallization kinetics in the special case of plate-shaped samples with a finitethickness. As a result, we obtained an adapted JMAK model revealing the thickness range which influences the crystallization kinetics mode significantly. The analytical solution also provides theoretical bounds for the film thickness, where the assumption of 2D or 3D kinetics is accurate. Finally, the conclusions related to amorphous silicon and amorphous nickel-titanium thin films are reported.

  • Czech name

  • Czech description

Classification

  • Type

    J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)

  • CEP classification

    BM - Solid-state physics and magnetism

  • OECD FORD branch

Result continuities

  • Project

    <a href="/en/project/ED2.1.00%2F03.0088" target="_blank" >ED2.1.00/03.0088: Centre of the New Technologies and Materials</a><br>

  • Continuities

    P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)

Others

  • Publication year

    2014

  • Confidentiality

    S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů

Data specific for result type

  • Name of the periodical

    Journal of Applied Physics

  • ISSN

    0021-8979

  • e-ISSN

  • Volume of the periodical

    115

  • Issue of the periodical within the volume

    4

  • Country of publishing house

    US - UNITED STATES

  • Number of pages

    5

  • Pages from-to

    043505-1 - 043505-5

  • UT code for WoS article

    000331210800020

  • EID of the result in the Scopus database