Finite-thickness effect on crystallization kinetics in thin films and its adaptation in the Johnson-Mehl-Avrami-Kolmogorov model
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F14%3A43922004" target="_blank" >RIV/49777513:23640/14:43922004 - isvavai.cz</a>
Result on the web
<a href="http://dx.doi.org/10.1063/1.4862858" target="_blank" >http://dx.doi.org/10.1063/1.4862858</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1063/1.4862858" target="_blank" >10.1063/1.4862858</a>
Alternative languages
Result language
angličtina
Original language name
Finite-thickness effect on crystallization kinetics in thin films and its adaptation in the Johnson-Mehl-Avrami-Kolmogorov model
Original language description
The Johnson-Mehl-Avrami-Kolmogorov (JMAK) model is widely used to quantify the isothermal crystallization kinetics. The present work reports an analytical solution for the crystallization kinetics in the special case of plate-shaped samples with a finitethickness. As a result, we obtained an adapted JMAK model revealing the thickness range which influences the crystallization kinetics mode significantly. The analytical solution also provides theoretical bounds for the film thickness, where the assumption of 2D or 3D kinetics is accurate. Finally, the conclusions related to amorphous silicon and amorphous nickel-titanium thin films are reported.
Czech name
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Czech description
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Classification
Type
J<sub>x</sub> - Unclassified - Peer-reviewed scientific article (Jimp, Jsc and Jost)
CEP classification
BM - Solid-state physics and magnetism
OECD FORD branch
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Result continuities
Project
<a href="/en/project/ED2.1.00%2F03.0088" target="_blank" >ED2.1.00/03.0088: Centre of the New Technologies and Materials</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)
Others
Publication year
2014
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Journal of Applied Physics
ISSN
0021-8979
e-ISSN
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Volume of the periodical
115
Issue of the periodical within the volume
4
Country of publishing house
US - UNITED STATES
Number of pages
5
Pages from-to
043505-1 - 043505-5
UT code for WoS article
000331210800020
EID of the result in the Scopus database
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