Pulsed laser deposition of Ga doped ZnO films - Influence of deposition temperature and laser pulse frequency on structural, optical and electrical properties
The result's identifiers
Result code in IS VaVaI
<a href="https://www.isvavai.cz/riv?ss=detail&h=RIV%2F49777513%3A23640%2F19%3A43954229" target="_blank" >RIV/49777513:23640/19:43954229 - isvavai.cz</a>
Result on the web
<a href="http://hdl.handle.net/11025/31208" target="_blank" >http://hdl.handle.net/11025/31208</a>
DOI - Digital Object Identifier
<a href="http://dx.doi.org/10.1016/j.vacuum.2018.10.031" target="_blank" >10.1016/j.vacuum.2018.10.031</a>
Alternative languages
Result language
angličtina
Original language name
Pulsed laser deposition of Ga doped ZnO films - Influence of deposition temperature and laser pulse frequency on structural, optical and electrical properties
Original language description
The contribution deals with Ga doped ZnO films (deposited from a sintered target composed of 99.0 ZnO and 1.0wt % of Ga2O3) prepared by pulsed laser deposition (PLD). Experimentally were compared the deposition parameters influence on structural, optical and electrical properties. The variable parameters were: deposition temperature (RT to 500°C) and growth rate (controlled by laser pulsing repetition frequency in range 2–50Hz). Investigation by SEM and XRD confirmed columnar structure of prepared films with highly uniform crystallographic orientation regardless of applied deposition parameters. Samples exhibited high optical transparency in VIS region with sharp absorption edge near380nmand bandgap energies varied between3.19and 3.24eVat room temperature. The best electrical properties (resistivity ∼5.96×10−4Ωcm) was achieved at 400°C and 10Hz of laser frequency, however the application of deposition at RT or highest laser frequency (50Hz) still maintain average resistivity at levels of 10−3Ωcm. The results suggest that PLD can play an important role in production of high conductive transparent thin film deposited on temperature sensitive organic materials at RT deposition levels.
Czech name
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Czech description
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Classification
Type
J<sub>imp</sub> - Article in a specialist periodical, which is included in the Web of Science database
CEP classification
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OECD FORD branch
10301 - Atomic, molecular and chemical physics (physics of atoms and molecules including collision, interaction with radiation, magnetic resonances, Mössbauer effect)
Result continuities
Project
<a href="/en/project/EF15_003%2F0000358" target="_blank" >EF15_003/0000358: Computational and Experimental Design of Advanced Materials with New Functionalities</a><br>
Continuities
P - Projekt vyzkumu a vyvoje financovany z verejnych zdroju (s odkazem do CEP)<br>I - Institucionalni podpora na dlouhodoby koncepcni rozvoj vyzkumne organizace
Others
Publication year
2019
Confidentiality
S - Úplné a pravdivé údaje o projektu nepodléhají ochraně podle zvláštních právních předpisů
Data specific for result type
Name of the periodical
Vacuum
ISSN
0042-207X
e-ISSN
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Volume of the periodical
159
Issue of the periodical within the volume
JAN 2019
Country of publishing house
GB - UNITED KINGDOM
Number of pages
7
Pages from-to
134-140
UT code for WoS article
000454964400016
EID of the result in the Scopus database
2-s2.0-85055038772